State-space modeling of the radio frequency inductively-coupled plasma generator

Characteristics of pulsed dual frequency inductively coupled plasma

Effects of radio frequency bias frequency and radio frequency bias pulsing on SiO2 feature etching in inductively coupled fluorocarbon plasmas

The effect of radio frequency ~rf! bias frequency on SiO2 feature etching using inductively coupled fluorocarbon plasmas is investigated. It is found that the rf bias frequency can have an important effect on SiO2 feature etch rate, microtrenching phenomena, and SiO2-to-photoresist etch selectivity. In addition, the effect of rf bias pulsing on inductively coupled fluorocarbon plasma SiO2 etchi...

Inductively coupled plasma mass spectrometry.

Review

Laser Ablation Inductively Coupled Plasma

Laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) is one of the most successful direct solid sampling techniques for major, minor and trace element analysis. However, this technique still suffers from matrix dependent ablation characteristics, which makes quantification very difficult. Furthermore, the laser sampled material alters its composition from the sample to the de...

Miniaturization of Inductively Coupled Plasma Sources

The scaling laws associated with the miniaturization of planar inductively coupled plasmas (ICPs) are investigated. The applications for miniature ICPs include microelectromechanical systems (MEMS) for chemical analysis. Langmuir probe and microwave interferometry measurements of three ICPs with coil diameters of 5, 10, and 15 mm show that electron density typically falls in the range of 10 10 ...